| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having excellent sensitivity and resolution for far UV rays as typified by an ArF excimer laser, excellent in the pattern profile or the like, and suitable as a chemically amplifying resist. <P>SOLUTION: The radiation-sensitive resin composition contains: (A) a resin in which a hydrogen atom in a hydroxyl group or a carboxyl group is substituted with an acid dissociable group having suppression ability against dissolving in alkali and which increases the solubility with an alkali aqueous solution when the acid dissociable group is dissociated; and a radiation-sensitive acid producing agent containing (B1) a sulfonium salt as typified by 1-(3,5-dimethyl-4-hydroxyphenyl)tetrahydrothiophenium perfluoro-n-octane sulfonate, 1-(4-n-butoxy-1-naphthyl)tetrahydrothiophenium nonafluoro-n-butane sulfonate or the like and (B2) a sulfonium salt as typified by triphenylsulfonium nonafluoro-n-butane sulfonate or the like. <P>COPYRIGHT: (C)2004,JPO |
