ETCHING METHOD OF SILICON SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide an etching method of a silicon substrate for reducing a reflectance ratio on a surface of the silicon substrate and manufacturing a solar battery having high conversion efficiency.

SOLUTION: The etching method has a first process for immersing the unprocessed silicon substrate in mixed acid water solution A comprising 36 weight % to 42 weight % of hydrofluoric acid and 6 weight % to 10 weight % of nitric acid and etching the substrate, and a second process for immersing the silicon substrate etched in the first process in mixed acid water solution B comprising 42 weight % to 46 weight % of hydrofluoric acid and 2 weight % to 6 weight % of nitric acid and etching the substrate.

COPYRIGHT: (C)2004,JPO