发明名称 APPARATUS FOR ANALYZING SURFACE REACTION PROCESS OF DIFFUSING MATERIAL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an apparatus for analyzing the surface reaction processes of diffusing materials capable of efficiently performing experiments and analyses. <P>SOLUTION: The apparatus for analyzing the surfaces reaction processes of the diffusing materials is provided with an occlusion chamber 1 supplied inside with hydrogen; a deuterium supply means (hydrogen supply means) 4 for supplying hydrogen to the occlusion chamber 1; a plurality of discharge chambers 5 for airtightly sandwiching and arranging samples (the diffusing materials) A capable of diffusing hydrogen between them and the occlusion chamber 1; and a plurality of analyzers 6 provided on the occlusion chambers 1; each opposed to the discharge chambers 5. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004061315(A) 申请公布日期 2004.02.26
申请号 JP20020220382 申请日期 2002.07.29
申请人 MITSUBISHI HEAVY IND LTD 发明人 ITO TAKEHIKO;SAKANO MITSURU;SAKAI TOMOTSUGU;ICHIHARA TARO;IWAMURA YASUHIRO
分类号 G01N23/227;(IPC1-7):G01N23/227 主分类号 G01N23/227
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