发明名称 |
APPARATUS FOR ANALYZING SURFACE REACTION PROCESS OF DIFFUSING MATERIAL |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus for analyzing the surface reaction processes of diffusing materials capable of efficiently performing experiments and analyses. <P>SOLUTION: The apparatus for analyzing the surfaces reaction processes of the diffusing materials is provided with an occlusion chamber 1 supplied inside with hydrogen; a deuterium supply means (hydrogen supply means) 4 for supplying hydrogen to the occlusion chamber 1; a plurality of discharge chambers 5 for airtightly sandwiching and arranging samples (the diffusing materials) A capable of diffusing hydrogen between them and the occlusion chamber 1; and a plurality of analyzers 6 provided on the occlusion chambers 1; each opposed to the discharge chambers 5. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2004061315(A) |
申请公布日期 |
2004.02.26 |
申请号 |
JP20020220382 |
申请日期 |
2002.07.29 |
申请人 |
MITSUBISHI HEAVY IND LTD |
发明人 |
ITO TAKEHIKO;SAKANO MITSURU;SAKAI TOMOTSUGU;ICHIHARA TARO;IWAMURA YASUHIRO |
分类号 |
G01N23/227;(IPC1-7):G01N23/227 |
主分类号 |
G01N23/227 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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