| 摘要 |
A deposition system includes at least one first load lock chamber, at least one deposition chamber attached to the first load lock chamber, the at least one deposition chamber having a plurality of deposition sources disposed circumferentially about sidewalls of the deposition chamber, at least one second load lock chamber attached to the deposition chamber, a plurality of gas inlet ports and vacuum line ports disposed on each of the first and second load lock chambers and the deposition chamber, and a plurality of rotatable deposition pallets, at least one deposition pallet is disposed within the deposition chamber and at least one deposition pallet is disposed in one of the first and second load lock chambers, wherein the at least one deposition pallet disposed in one of the first and second load lock chambers laterally shifts into the deposition chamber when the at least one deposition pallet disposed in the deposition chamber laterally shifts from the deposition chamber into another one of the first and second load lock chambers. |
