THIN FILM DEPOSITING APPARATUS AND METHOD THEREOF

摘要

PURPOSE: A thin film depositing apparatus and method thereof are provided to be capable of uniformly depositing a thin film. CONSTITUTION: A thin film depositing apparatus is provided with a chamber having a reflecting part(113) and an injector(130) prolonged from the upper surface of the chamber to the lower direction. The thin film depositing apparatus further includes a distributor(140) connected with the injector and a heater block(120) located at the lower portion of the distributor for stably loading a deposition object part. At this time, the distributor includes a plurality of porosities symmetrically formed at the lower portion for radially distributing the thin film source material flowed from a gas path. Preferably, the size of the inlet is larger than that of the outlet at each porosity.