发明名称 |
Substrate treating apparatus |
摘要 |
A substrate treating apparatus has an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition, each of these blocks including treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block, and transfers the substrates between the blocks through inlet substrate rests and outlet substrate rests provided as separate components. This construction realizes improved throughput of the substrate treating apparatus.
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申请公布号 |
US2004037677(A1) |
申请公布日期 |
2004.02.26 |
申请号 |
US20030646902 |
申请日期 |
2003.08.22 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
KOYAMA YASUFUMI;KAMEI KENJI;KITAMOTO TORU;HASHINOKI KENJI;YAMAMOTO SATOSHI;DAININ TOSHIAKI |
分类号 |
B65G49/07;H01L21/00;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):B65H1/00 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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