| 摘要 |
Processes of patterning substrates by imprint lithography using an apparatus (3900) including an imprint head (3100), an activating light source (3500), a motion stage (3600), a patterned template (3700), an imprint head support (3910), a motion stage support (3920), bridging supports (3930) and a support table (3940). |
| 申请人 |
MOLECULAR IMPRINTS INC.;SREENIVASAN, SIDLGATA;CHOI, BYUNG-JIN;WATTS, MICHAEL;SCHUMAKER, NORMAN;VOISIN, RONALD;MEISSL, MARIO;BONNECAZE, ROGER;WILLSON, GRANT |
发明人 |
SREENIVASAN, SIDLGATA;CHOI, BYUNG-JIN;WATTS, MICHAEL;SCHUMAKER, NORMAN;VOISIN, RONALD;MEISSL, MARIO;BONNECAZE, ROGER;WILLSON, GRANT |
