发明名称 |
NEGATIVE TYPE LIQUID PHOTORESIST COMPOSITION |
摘要 |
PURPOSE: Provided is a negative type liquid photoresist composition, which has excellent close contact force of fine lines and resolution and improved coating capability with no coating defects. CONSTITUTION: The negative type liquid photoresist composition comprises a binder polymer, a photopolymerization initiator, a photopolymerization monomer and an additive, wherein the bonder polymer is an acrylate polymer dissolved in the solvent of 1-methoxy-2-propanol. In particular, the acrylate polymer has a glass transition temperature of 100-150 deg.C, an acid value of 40-130 mgKOH/g and a weight average molecular weight of 20000-60000. Additionally, the additive is preferably triphenyl phosphate.
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申请公布号 |
KR20040017063(A) |
申请公布日期 |
2004.02.26 |
申请号 |
KR20020049169 |
申请日期 |
2002.08.20 |
申请人 |
KOLON IND. INC./KR |
发明人 |
CHO, JAE HYEON;CHOI, JUN HYEOK;HAN, GUK HYEON;JUNG, CHANG BEOM;KIM, CHANG GEON |
分类号 |
G03F7/032;(IPC1-7):G03F7/032 |
主分类号 |
G03F7/032 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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