发明名称 GLASS MATERIAL SUITABLY SUBJECTED TO MICROFABRICATION BY DRY ETCHING
摘要 PROBLEM TO BE SOLVED: To provide a new glass material, from which an element having excellent optical performances can be formed with a high precision and at a high speed by etching, and a finely fabricated body obtained from the glass material, which is useful as the optical element or the like. SOLUTION: The glass material suitably subjected to microfabrication comprises glass containing, as a main component, SiO<SB>2</SB>and at least one kind of additive component selected from the group of GeO<SB>2</SB>, B<SB>2</SB>O<SB>3</SB>, P<SB>2</SB>O<SB>5</SB>, Al<SB>2</SB>O<SB>3</SB>and fluorine. The microfabrication method of the glass material comprises fabricating the glass material by a dry etching method. The precisely fabricated body is obtained by dry etching the glass material. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004059329(A) 申请公布日期 2004.02.26
申请号 JP20020215951 申请日期 2002.07.25
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 NISHII JUNJI;KANETAKA KENJI
分类号 G02B5/18;C03C3/083;C03C3/089;C03C3/091;C03C3/097;C03C3/112;C03C3/115;C03C3/118;C03C15/00;(IPC1-7):C03C3/118 主分类号 G02B5/18
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