| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for supplying vaporization, which obtains high quality and high-purity semiconductor film, by efficiently performing vaporization with a single vaporizer for supply to a semiconductor manufacturing device, without causing deterioration in individual CVD materials or attachment of solid materials in formation of a ferroelectric film such as BZT, BST, SBT, PLZT or the like. SOLUTION: The apparatus for supplying vaporization consists of a plurality of CVD material supply lines, each having a liquid flow rate control unit; a means for mixing the plural kinds of CVD materials supplied from these CVD material supply lines; a filter for filtering the mixed CVD materials; and the vaporizer, in which a CVD material supply part is at least incorporated with a first channel for flowing the CVD materials, a second channel for flowing a carrier gas and a third channel for converging the CVD materials and the carrier gas from the two channels and injecting the same to a vaporization chamber. Supplying of vaporization is performed by using the apparatus. COPYRIGHT: (C)2004,JPO
|
