发明名称 FILM QUALITY JUDGING METHOD AND SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a film quality judging method for instantaneously detecting a change of film quality of a workpiece irrespective of the change of a reactive creature and securely reducing work failures. SOLUTION: The method includes a process for forming a film on a surface of the workpiece 12 carried into a processing chamber 16, a process for irradiating the surface of the workpiece 12 with light from a photo irradiation unit 40 during a processing on the workpiece 12 and detecting reflection light quantity by a photodetector 42, and a process for judging film quality on the surface of the workpiece 12 by a film quality judging part 44 based on detected reflection light quantity. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004063752(A) 申请公布日期 2004.02.26
申请号 JP20020219654 申请日期 2002.07.29
申请人 SEIKO EPSON CORP 发明人 HISADA MASAHIRO
分类号 G01N21/956;H01L21/027;H01L21/3065;(IPC1-7):H01L21/306 主分类号 G01N21/956
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