| 摘要 |
PROBLEM TO BE SOLVED: To provide a film formation method capable of effectively forming a high crystallinity and high quality film formed on a high temperature condition and/or processed by a high temperature treatment on a non-heat-resistant film formation substrate such as a plastic material. SOLUTION: After forming at least one layer of film by a film formation process including a higher temperature process than a heat-resistant temperature of a substrate on the surface of the heat-resistant member having a higher heat-resistant than that of the substrate where the film is formed, the problem is solved by transferring the film formed on the heat-resistant member to the surface of the substrate on the temperature less than the heat-resistant temperature of the substrate. COPYRIGHT: (C)2004,JPO
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