| 摘要 |
A method of forming at least one optic element in an optical layer, including the steps of: providing a mask over the optical layer (21); patterning the mask by removal of selected portions thereof to define at least one hole in the mask that exposes a selected portion of the optical layer; and etching the optical layer through the at least one hole; wherein the mask includes a layer of doped silicon oxide, and including the step of prior to the etching step flowing the layer of doped silicon oxide so as to smooth the edges of the patterned mask that define the hole; and the use of this technique for the purpose of increasing the smoothness with which the vertical walls of one or more optical elements can be formed in an underlying optical layer during a subsequent step of etching through the patterned mask. |
