发明名称 Fine structure composite and drying method of fine structure using the same
摘要 The present invention provides a fine structure composite composed of a fine structure and a protection film formed thereon. The fine structure composite is used prior to a step of drying the fine structure in a high pressure chamber using a liquefied or a supercritical fluid, and the protection film is formed of a high viscosity material. When the fine structure such as a semiconductor substrate after development is dried using a liquefied or a supercritical fluid, the surface of the fine structure such as the substrate is prevented from being spontaneously dried, and as a result, a pattern on the surface is prevented from being collapsed.
申请公布号 US2004038060(A1) 申请公布日期 2004.02.26
申请号 US20030641080 申请日期 2003.08.15
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO 发明人 KAWAKAMI NOBUYUKI;KOBORI TAKASHI;KUGIMIYA TOSHIHIRO
分类号 C23C26/00;B29C71/00;B32B27/00;B81C1/00;H01L21/027;(IPC1-7):B32B27/00 主分类号 C23C26/00
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