发明名称 |
Fine structure composite and drying method of fine structure using the same |
摘要 |
The present invention provides a fine structure composite composed of a fine structure and a protection film formed thereon. The fine structure composite is used prior to a step of drying the fine structure in a high pressure chamber using a liquefied or a supercritical fluid, and the protection film is formed of a high viscosity material. When the fine structure such as a semiconductor substrate after development is dried using a liquefied or a supercritical fluid, the surface of the fine structure such as the substrate is prevented from being spontaneously dried, and as a result, a pattern on the surface is prevented from being collapsed.
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申请公布号 |
US2004038060(A1) |
申请公布日期 |
2004.02.26 |
申请号 |
US20030641080 |
申请日期 |
2003.08.15 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO |
发明人 |
KAWAKAMI NOBUYUKI;KOBORI TAKASHI;KUGIMIYA TOSHIHIRO |
分类号 |
C23C26/00;B29C71/00;B32B27/00;B81C1/00;H01L21/027;(IPC1-7):B32B27/00 |
主分类号 |
C23C26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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