| 摘要 |
PURPOSE: An LCD line forming method is provided to prevent the corrosion of glass substrate by carrying out wet etching instead of dry etching, and form the lines by carrying out first and second wet etching by simply changing etchant in a same chamber. CONSTITUTION: An LCD line forming method includes the steps of depositing an Al, Al layer(22) and a Mo layer(23) on a glass substrate(21), and forming a photosensitive film pattern(24) at a predetermined position on the Mo layer by exposing and developing the Mo layer. By using the photosensitive film pattern, the Mo layer and the Al layer are selectively removed by primary wet etching. A wet etching solution is formed of phosphoric acid/nitric acid/super acid in a composition rate of 30-70%/2-30%/1-20% in a DI water solution. After the wet etching, the Mo layer has an overhang structured profile by the electric potential difference of Galvanic Corrosion between the Mo layer and the Al layer. In order to remove the overhang of the Mo layer, secondary wet etching is carried out by using H2O2 or C.A.N.(Ceric Ammonium Nitride) solution. The primary and secondary wet etching is carried out in a same chamber or different chambers as desired. If the remaining photosensitive film pattern is removed, wires are formed with a stepped difference.
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