发明名称 |
APPARATUS AND METHOD FOR DRYING SUBSTRATE |
摘要 |
PURPOSE: A method for drying a substrate is provided to improve substrate drying efficiency by increasing the solubility of isopropyl alcohol. CONSTITUTION: A receptacle in which a cleaned substrate is received is sealed(S120). Isopropyl alcohol vapor is supplied to the inside of the receptacle to increase the pressure inside the receptacle to the atmospheric pressure or higher(S130). Moisture is eliminated from the surface of the cleaned substrate by using the pressurized isopropyl alcohol vapor(S140). The pressurized isopropyl alcohol vapor is exhausted(S150). The isopropyl alcohol vapor is supplied by using heated nitrogen gas as carrier gas.
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申请公布号 |
KR20040016704(A) |
申请公布日期 |
2004.02.25 |
申请号 |
KR20020048987 |
申请日期 |
2002.08.19 |
申请人 |
K.C. TECH CO., LTD. |
发明人 |
JANG, SEONG GI;KWON, YEONG GYU;LEE, UI GANG;PARK, YEONG CHUN |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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