METHOD OF PRODUCING GLASS SUBSTRATE FOR MASK BLANK, METHOD OF PRODUCING MASK BLANK, METHOD OF PRODUCING TRANSFER MASK, METHOD OF PRODUCING SEMICONDUCTOR DEVICE, GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, AND TRANSFER MASK

摘要

PURPOSE: A method of producing a glass substrate for a mask blank is provided to prevent defects of fine convex surface and to remove phase defects by using an abrasive grain containing colloidal silica. CONSTITUTION: In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of a polishing liquid containing abrasive grains. At this time, the abrasive grains further contains colloidal silica abrasive grains produced by hydrolysis of an organosilicon compound.