发明名称 Jodoniumsalter som fotoinitiatorer, belagt substrat, fotoresist och förening innefattande salterna och användning av salterna samt förfarande för fotopolymerisation för framställning av reliefbilder och vid framställning av ytbeläggningskompositioner
摘要 Radiation-sensitive compositions comprising(a1) a cationically or acid-catalytically polymerisable or crosslinkable compound or(a2) a compound that increases its solubility in a developer under the action of acid; and(b) at least one diaryliodonium salt of formula IX is branched C3-C20alkyl or C3-C8cycloalkyl;X1 is hydrogen, linear C1-C20alkyl, branched C3-C20alkyl or C3-C8cycloalkyl; with the proviso that the sum of the carbon atoms in X and X1 is at least 4;Y is linear C1-C10alkyl, branched C3-C10alkyl or C3-C8cycloalkyl;A- is a non-nucleophilic anion, selected from the group (BF4)-, (SbF6)-, (PF6)-, (B(C6F5))4-, C1-C20alkylsulfonate, C2-C20haloalkylsulfonate, unsubstituted C6-C10arylsulfonate, camphorsulfonate, and C6-C10arylsulfonate substituted by halogen, NO2, C1-C12alkyl, C1-C12halo-alkyl, C1-C12alkoxy or by COOR1; andR1 is C1-C20alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C1-C12alkyl, C1-C12alkoxy or by halogen;with the proviso that the two phenyl rings on the iodine atom are not identically substituted.
申请公布号 SE522682(C2) 申请公布日期 2004.02.24
申请号 SE20000004681 申请日期 2000.12.18
申请人 CIBA SPECIALTY CHEMICALS HOLDING INC 发明人 HITOSHI YAMATO;JEAN-LUC BIRBAUM;JEAN-PIERRE WOLF;REINHARD SCHULZ;STEPHAN ILG;TOSHIKAGE ASAKURA
分类号 C07C17/00;C07C25/18;C08F2/50;C08G59/68;C08G65/10;G03F7/004;G03F7/029;G03F7/038;G03F7/039;(IPC1-7):G03F7/029 主分类号 C07C17/00
代理机构 代理人
主权项
地址