发明名称 Method and apparatus for removing organic films
摘要 A method and an apparatus for removing an organic film such as a resist film from a substrate surface are provided. These are very safe even at high temperatures, and use a treatment liquid which can be recycled and reused. A treatment liquid typically formed from liquid ethylene carbonate, propylene carbonate, or a liquid mixture of these two compounds, and in particular such a treatment liquid containing dissolved ozone, is contacted with a substrate with an organic film, and the organic film is removed. Furthermore, an apparatus of the present invention (A) a treatment liquid delivery device for transporting the treatment liquid to a treatment area, (B) a film contact device for bringing the treatment liquid into contacting with the organic film surface of the substrate within the treatment area, (C) a liquid circulation device for recycling treatment liquid discharged from the treatment area and returning the recycled liquid to the treatment area via one or more temporary storage devices, and (D) an ozone dissolution device for bringing ozone containing gas into contact with the treatment liquid either within the treatment area and/or within the temporary storage devices.
申请公布号 US6696228(B2) 申请公布日期 2004.02.24
申请号 US20020274153 申请日期 2002.10.21
申请人 UMS CO., LTD.;NOMURA MICRO SCIENCE CO., LTD. 发明人 MURAOKA HISASHI;MURAOKA RIEKO;SATO ASUKA;ENDO MITSURU
分类号 G02F1/13;B08B3/02;B08B3/04;C09D9/00;C11D7/26;C11D11/00;G02F1/1333;G03F7/42;H01L21/027;H01L21/304;H01L21/306;H01L21/3063;H01L21/3065;(IPC1-7):G03F7/42;C03C23/00;B08B7/04;C23G1/36 主分类号 G02F1/13
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