| 摘要 |
A process for fabricating micro-mirrors on a silicon substrate is disclosed, which can markedly improve the flatness of micro-mirrors, reduce the scattering of incident light, and increase S/N ratio. The fabrication process comprises the steps of: forming micro-planes along a certain direction on a silicon substrate to serve as mirrors; forming a SiO2 layer on the silicon substrate; and melting the SiO2 layer on the micro-planes by a heating process and then crystallizing SiO2 again to form micro-mirrors. Further, instead of coating the SiO2 layer, a metal layer can be used to form a eutectic structure with the silicon substrate. After the micro-mirrors are formed, a layer of Au can be coated thereon to increase the reflectance of the micro-mirrors.
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