发明名称 SYSTEM AND METHOD FOR MASKLESS LITHOGRAPHY USING AN ARRAY OF SOURCES AND AN ARRAY OF FOCUSING ELEMENTS
摘要 A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing elements to respectively focus associated photon beams on the substrate.
申请公布号 AU2003274903(A1) 申请公布日期 2004.02.23
申请号 AU20030274903 申请日期 2003.07.28
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 RAJESH MENON;DAVID CARTER;HENRY, I. SMITH;GEORGE BARBASTATHIS;DARIO GIL
分类号 G03F;G03F7/20;G21G5/00;G21K5/04;H01J37/317;H01L27/00 主分类号 G03F
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