发明名称 |
SYSTEM AND METHOD FOR MASKLESS LITHOGRAPHY USING AN ARRAY OF SOURCES AND AN ARRAY OF FOCUSING ELEMENTS |
摘要 |
A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing elements to respectively focus associated photon beams on the substrate. |
申请公布号 |
AU2003274903(A1) |
申请公布日期 |
2004.02.23 |
申请号 |
AU20030274903 |
申请日期 |
2003.07.28 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
RAJESH MENON;DAVID CARTER;HENRY, I. SMITH;GEORGE BARBASTATHIS;DARIO GIL |
分类号 |
G03F;G03F7/20;G21G5/00;G21K5/04;H01J37/317;H01L27/00 |
主分类号 |
G03F |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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