APPARATUS FOR PROCESSING TARGET PROCESSING SUBSTRATE

摘要

PURPOSE: An apparatus for processing a target processing substrate is provided to prevent the atmosphere in a process chamber from leaking through a window portion for transferring the target processing substrate or through an inlet port for inducing outside air by using a very simple structure. CONSTITUTION: The apparatus for processing the target processing substrate includes an openable window portion for transferring the target processing substrate and an inlet port for introducing the outer atmosphere. The processing apparatus further includes a closed processing chamber for performing predetermined processing for the target processing substrate transferred via the window portion, an exhaust unit for evacuating the interior of the processing chamber, and an opening/closing mechanism for closing the inlet port and opening the inlet port when the pressure in the processing chamber is negative.