发明名称 PRODUCTION OF SPUTTERING MAGNETIC CIRCUIT
摘要 PURPOSE: A sputtering magnetic circuit is provided to enhance the efficiency of target by forming uniformly plasma on the entire region of the target. CONSTITUTION: A sputtering magnetic circuit includes a main magnet, a plurality of auxiliary magnets, and a peripheral magnet. The main magnet(12a) is installed on a surface of a steel plate. The peripheral magnet(12f) is installed at a predetermined position opposite to the main magnet. The auxiliary magnets(12b to 12e) are installed between the main magnet and the peripheral magnet. A target is installed at an upper side of the main magnet, the auxiliary magnets, and the peripheral magnet. The lines of the magnetic force are parallel to the target. The lines of the magnetic force have one local minimum point and two local maximum points.
申请公布号 KR100421249(B1) 申请公布日期 2004.02.21
申请号 KR20020072106 申请日期 2002.11.19
申请人 PARK, JANG SICK 发明人 PARK, JANG SICK
分类号 H01L21/203;(IPC1-7):H01L21/203 主分类号 H01L21/203
代理机构 代理人
主权项
地址