发明名称 |
Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process |
摘要 |
Sulfonyldiazomethane compounds containing a long-chain alkyl- or alkoxy-naphthyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, and minimized line width variation or shape degradation even on long-term PED.
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申请公布号 |
US2004033432(A1) |
申请公布日期 |
2004.02.19 |
申请号 |
US20030636541 |
申请日期 |
2003.08.08 |
申请人 |
OHSAWA YOUICHI;WATANABE SATOSHI;MAEDA KAZUNORI |
发明人 |
OHSAWA YOUICHI;WATANABE SATOSHI;MAEDA KAZUNORI |
分类号 |
C07C317/28;G03F7/004;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/004;G03F7/30;C07C245/16 |
主分类号 |
C07C317/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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