| 摘要 |
A method of scanning a deep feature using an atomic force microscopy (AFM) tip, which includes: locating and mapping the deep feature with a surface survey scan; analyzing the scan data to identify an initial optimum location; moving the AFM tip to the initial optimum location; and repeating a first procedure until the AFM tip reaches a bottom of the deep feature, which includes: (a) lowering the AFM tip in a first direction by a first distance increment; (b) measuring atomic force interactions exerted on the AFM tip to determine whether the bottom of the deep feature has been reached; (c) moving the AFM tip in a geometric pattern and within a current plane; (d) measuring atomic force interactions exerted on the AFM tip at various locations in the geometric pattern to determine a new optimum location where the atomic force interactions are minimum; and (e) moving the AFM tip to the new optimum location, repeating (a-e) until bottom has been reached, (f) then measure the depth.
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