发明名称 Erosion-resistant components for plasma process chambers
摘要 An erosion-resistant article for use as a component in plasma process chamber. The erosion-resistant article comprises a support and an oxide coating comprising yttrium, which is disposed over the support. The support and the oxide coating preferably have material compositions that differ from one another in coefficient of thermal expansion by no more than 5x10<-6>/K. Preferred oxide coating compositions include yttria and yttrium aluminum garnet. Preferred supports include alumina supports and aluminum-silicon carbide supports.
申请公布号 US2004033385(A1) 申请公布日期 2004.02.19
申请号 US20010892212 申请日期 2001.06.25
申请人 KAUSHAL TONY S.;WANG YOU;KUMAR ANANDA H. 发明人 KAUSHAL TONY S.;WANG YOU;KUMAR ANANDA H.
分类号 H01J37/32;(IPC1-7):B05D3/02;C23C16/00;B05D1/08;B32B15/04 主分类号 H01J37/32
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