MASK AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a mask in which a variation in dimension caused by an exposure device (conventionally correctable because it can be predicted) and the variation in dimension due to a mask manufacturing error (conventionally uncorrectable because manufacturing errors are randomly caused for every mask manufacture), and its manufacturing method.

SOLUTION: The transmission type or reflection type mask has the enhanced dimensional uniformity of a transfer pattern on an image formation surface by partially adjusting transmissivity or reflectivity. In the method for manufacturing the mask, the pattern on the mask is transferred to the image formation surface to measure the dimensional distribution and then the transmission of the mask is adjusted so as to cancel the tendency of the distribution.

COPYRIGHT: (C)2004,JPO