发明名称 APPARATUS FOR MANUFACTURING CHEMICAL AMPLIFICATION SYSTEM RESIST LIQUID AND METHOD FOR MANUFACTURING CHEMICAL AMPLIFICATION SYSTEM RESIST LIQUID USING THE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for efficiently and sequentially manufacturing two kinds of chemical amplification system resist differing in solid component from each other and a method for manufacturing the chemical amplification system resist liquid using the apparatus. SOLUTION: The apparatus is equipped with a manufacture line constituted by connecting after-mentioned parts (a) to (e) in order and a reverse washing line comprising (d) to (e). Those parts are: (a) a preparation tank for preparing chemical amplification system resist liquid by mixing solid components and solvent components; (b) a housing storing a filter for filtering the prepared resist liquid; (c) a charging device with a charging opening for charging the filtered resist liquid in a container; (d) a reverse washing device equipped with a housing for washing the filter detached from the housing (b) reversely to the direction in the filtering in the order of a washing solvent and a solvent component; and (e) a pipe connecting the charging opening of (c) and reverse washing device together. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004053887(A) 申请公布日期 2004.02.19
申请号 JP20020210848 申请日期 2002.07.19
申请人 SUMITOMO CHEM CO LTD 发明人 HIOKI TAKESHI;TOKUHARA KOUTA
分类号 G03F7/26;(IPC1-7):G03F7/26 主分类号 G03F7/26
代理机构 代理人
主权项
地址