发明名称 |
APPARATUS FOR MANUFACTURING CHEMICAL AMPLIFICATION SYSTEM RESIST LIQUID AND METHOD FOR MANUFACTURING CHEMICAL AMPLIFICATION SYSTEM RESIST LIQUID USING THE APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for efficiently and sequentially manufacturing two kinds of chemical amplification system resist differing in solid component from each other and a method for manufacturing the chemical amplification system resist liquid using the apparatus. SOLUTION: The apparatus is equipped with a manufacture line constituted by connecting after-mentioned parts (a) to (e) in order and a reverse washing line comprising (d) to (e). Those parts are: (a) a preparation tank for preparing chemical amplification system resist liquid by mixing solid components and solvent components; (b) a housing storing a filter for filtering the prepared resist liquid; (c) a charging device with a charging opening for charging the filtered resist liquid in a container; (d) a reverse washing device equipped with a housing for washing the filter detached from the housing (b) reversely to the direction in the filtering in the order of a washing solvent and a solvent component; and (e) a pipe connecting the charging opening of (c) and reverse washing device together. COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004053887(A) |
申请公布日期 |
2004.02.19 |
申请号 |
JP20020210848 |
申请日期 |
2002.07.19 |
申请人 |
SUMITOMO CHEM CO LTD |
发明人 |
HIOKI TAKESHI;TOKUHARA KOUTA |
分类号 |
G03F7/26;(IPC1-7):G03F7/26 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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