PHOTORESIST COMPOSITIONS COMPRISING SOLVENTS FOR SHORT WAVELENGTH IMAGING

摘要

New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as nm. Resists of the invention comprise a fluorinecontaining polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.