MULTI-BEAM GENERATOR AND ELECTRON BEAM EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a multi-beam electron gun which generates a plurality of electron beams which are matched in characteristics. SOLUTION: The multi-beam electron gun 2 is composed of a plurality of electron guns 2a to 2c. The electron gun 2a is equipped with an electron source 21a, a Wehnelt electrode 22a, an anode electrode 23, and furthermore, a shield electrode 24 interposed between the Wehnelt electrode 22a and the anode electrode 23. The shield electrode 24 is capable of reducing electric field interference between the electron guns. COPYRIGHT: (C)2004,JPO