| 摘要 |
PROBLEM TO BE SOLVED: To prolong a film-forming period onto a substrate and increase a degree of freedom for forming a multilayered film. SOLUTION: An arc-type evaporation source 10a composing a vacuum arc vapor-deposition apparatus comprises several cathodes 14; a trigger drive unit 22a for performing an operation of switching a position of a trigger electrode 20 to the front of an arbitrary one cathode 14, and an operation of contacting and detaching the trigger electrode 20 with the cathode 14, at the switched position; a shutter 32 for covering the fronts of all the other cathodes 14 except the arbitrary one cathode 14; and a shutter drive unit 34 for performing an operation of moving the shutter 32 to switch the cathode 14 which is not covered with it. The vacuum arc vapor-deposition apparatus further has a switch-controlling unit 40 for controlling switching of the position of the trigger electrode 20 to the front of the cathode 14 which is not covered with the shutter 32, and switching of the cathode 14 which is not covered with the shutter 32, by controlling the shutter drive unit 34 and the trigger drive unit 22a. COPYRIGHT: (C)2004,JPO
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