| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle structure which consists of a pellicle frame and a pellicle film disposed atop this frame and permits checking of the concentration relating to oxygen, moisture, organic compound, etc., as well, and decides the displacement state of purge gas in the inside of the pellicle structure by checking the internal atmosphere of the pellicle structure in the state that the pellicle structure is held attached to a mask thereby easily deciding the condition of purgr gas within the pellicle structure, a system for checking the internal atmosphere thereof, and a method for deciding atmosphere replacement. <P>SOLUTION: The pellicle structure which is a pellicle structure consisting of the pellicle frame and the pellicle film disposed atop the pellicle frame and provided with a gas introducing port for introducing the purge gas and a gas exhaust port for exhausting the internal atmosphere gas and is provided with a translucent section consisting of a translucent material in at least a portion of the pellicle frame and a reflector for reflecting light to the inner wall of the pellicle film frame, the system for checking the internal atmosphere thereof and the method for deciding the atmosphere replacement are provided. <P>COPYRIGHT: (C)2004,JPO</p> |
