发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To prevent an increase in leak current resulting from the formation of a depletion layer in a semiconductor device whose life time is controlled by irradiating radioactive rays such as electron rays or the like. SOLUTION: There is provided a semiconductor device in which an active device including one or more pn junctions and a nitride film are formed on a principal surface at one side of a semiconductor substrate and on the surface of the pn junction, respectively, and further the life time of a semiconductor layer formed with the pn junction is controlled by the radioactive rays such as the electron rays, wherein the nitride film is provided which is invulnerable to the irradiation of the electron rays. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004055857(A) 申请公布日期 2004.02.19
申请号 JP20020211902 申请日期 2002.07.22
申请人 HITACHI LTD 发明人 TAKAYANAGI YUJI;SHIODA MASASHI;ONARI JUNICHI;KURITA SHINICHI;ITO MASAHIRO
分类号 H01L21/322;H01L29/78;(IPC1-7):H01L21/322 主分类号 H01L21/322
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