<p>The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.</p>
申请公布号
WO2004015772(A1)
申请公布日期
2004.02.19
申请号
WO2003US16423
申请日期
2003.05.23
申请人
NANOINK, INC.;CRUCHON-DUPEYRAT, SYLVAIN;NELSON, MICHAEL;RENDLEN, JEFF;FRAGALA, JOSEPH
发明人
CRUCHON-DUPEYRAT, SYLVAIN;NELSON, MICHAEL;RENDLEN, JEFF;FRAGALA, JOSEPH