发明名称 BACK GATE AND BOTTOM LAYER INTERCONNECT FOR ACTIVE MATRIX DISPLAYS
摘要 <p>Active matrix displays include transistors having a top gate row line (208) and a bottom gate row line (212). The bottom gate row line is situated below the top gate row line and can be driven in parallel with the top gate row line (208). The bottom gate row line (212) can be formed as a patterned refractory conductor that is covered with a dielectric layer (216). A transistor active layer, gate oxide, and top row line are formed on top of the dielectric layer (216).</p>
申请公布号 WO2004015673(A1) 申请公布日期 2004.02.19
申请号 WO2003US25424 申请日期 2003.08.12
申请人 ILJIN DIAMOND CO., LTD.;SHAPTON, THOMAS;KEITH, DAVID, L.;ODEKIRK, BRUCE 发明人 SHAPTON, THOMAS;KEITH, DAVID, L.;ODEKIRK, BRUCE
分类号 H01L27/12;G02F1/1362;(IPC1-7):G09G3/36 主分类号 H01L27/12
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