| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist removing apparatus which prevents a dry film resist from being entwined with or wound around a roller conveyor. SOLUTION: The resist removing apparatus is a resist removing apparatus A which removes a resist from a substrate G by scattering chemical liquid by a scattering means over the substrate G supported and conveyed by a conveyor roller 2, which is obliquely arranged, the roller shaft 21 of the conveyor roller 2 being cantilevered at its upper end. Further, the resist removing apparatus is equipped with a plurality of guide rollers 3 which support and carry the lower end of the substrate G. COPYRIGHT: (C)2004,JPO |
