ELECTRON BEAM EXPOSURE DEVICE AND ELECTRON BEAM INSTRUMENT MODULE

摘要

PROBLEM TO BE SOLVED: To provide an electron beam exposure device for exposing a wafer with high precision in plotting by controlling a current of the electron beam with high accuracy. SOLUTION: The electron beam exposure device 10 for exposing the wafer with an electron beam includes an electron gun 110 for generating an electron beam, a wafer stage 148 for holding the wafer 146 exposed by the electron beam, and a beam instrument module 20 provided at the wafer stage 148 for detecting the current of the electron beam and storing it as digital data. COPYRIGHT: (C)2004,JPO