| 摘要 |
Disclosed are apparatus and methods (Figs. 1-3B) for optically inspecting a voltage contrast type test structure (100), or the like. An optical image of a voltage contrast type test structure (100, 200, 300) is generated. When the optical image has a first type of intensity pattern (202 and 204), it is determined that there is a defect (212) within the test structure (200). When the optical image has a second type of intensity pattern (102 and 104), it is determined that there is no defect. The intensity patterns correspond to different voltage potential patterns that are expected to be generated if the test structure were subject to a voltage contrast inspection. That is, the first intensity pattern (202 and 204) corresponds to a first voltage potential pattern that would be generated during a voltage contrast inspection when there is a defect (212) present, and the second intensity pattern(102 and 104), corresponds to a second voltage potential pattern that would be generated during a voltage contrast inspection when there is not defect present. |
