发明名称 |
SUBSTRATE FOR ELECTRO-OPTIC DEVICE, MANUFACTURING METHOD OF SUBSTRATE FOR ELECTRO-OPTIC DEVICE, LIQUID CRYSTAL DEVICE, AND ELECTRONIC EQUIPMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate for an electro-optic device with excellent optical characteristics and electric characteristics, and hardly giving rise to deformation on a base material. <P>SOLUTION: The method includes an amorphous layer forming process forming an amorphous layer 9a on a substrate 101, a crystal nucleus forming process generating crystal nucleuses in the amorphous layer 9a under a heat treatment of 140 to 160°C , and a crystal growth process obtaining a conductive layer 9 by growing the crystal nucleuses generated under a heat treatment of 70 to 90°C. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2004055278(A) |
申请公布日期 |
2004.02.19 |
申请号 |
JP20020209687 |
申请日期 |
2002.07.18 |
申请人 |
SEIKO EPSON CORP |
发明人 |
NAGANO DAISUKE |
分类号 |
G02F1/1343;G02F1/1368;G09F9/00;G09F9/30;G09F9/35;H01B5/14;H01B13/00;(IPC1-7):H01B13/00;G02F1/134;G02F1/136 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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