发明名称 |
Negative resist composition |
摘要 |
A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound containing: in the molecule one or more benzene rings; and at least two cross-linking groups bonded to any of the benzene rings, the cross-linking group being a group selected from the group consisting of a hydroxymethyl group, an alkoxymethyl group and an acyloxymethyl group; (B-2) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent contains at least two specific groups; and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
|
申请公布号 |
US2004033441(A1) |
申请公布日期 |
2004.02.19 |
申请号 |
US20030642291 |
申请日期 |
2003.08.18 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
YASUNAMI SHOICHIRO;SHIRAKAWA KOJI |
分类号 |
C08F12/24;G03F7/004;G03F7/038;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
C08F12/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|