发明名称 Integrated method for release and passivation of MEMS structures
摘要 Disclosed herein is a method of improving the adhesion of a hydrophobic self-assembled monolayer (SAM) coating to a surface of a MEMS structure, for the purpose of preventing stiction. The method comprises treating surfaces of the MEMS structure with a plasma generated from a source gas comprising oxygen and, optionally, hydrogen. The treatment oxidizes the surfaces, which are then reacted with hydrogen to form bonded OH groups on the surfaces. The hydrogen source may be present as part of the plasma source gas, so that the bonded OH groups are created during treatment of the surfaces with the plasma. Also disclosed herein is an integrated method for release and passivation of MEMS structures which may be adjusted to be carried out in a either a single chamber processing system or a multi-chamber processing system.
申请公布号 US2004033639(A1) 申请公布日期 2004.02.19
申请号 US20030435757 申请日期 2003.05.09
申请人 APPLIED MATERIALS, INC. 发明人 CHINN JEFFREY D.;GUENTHER ROLF A.;RATTNER MICHAEL B.;COOPER JAMES A.;LEUNG TOI YUE BECKY;BJORKMAN CLAES H.
分类号 B81B3/00;B81C1/00;(IPC1-7):H01L21/00 主分类号 B81B3/00
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