发明名称 |
Fine stencil structure correction device |
摘要 |
A fine stencil structure correction device has a charged particle beam microscope lens-barrel which scans and corrects shapes of defect portions of a fine stencil structure sample using an etching or deposition function, and the fine stencil structure correction device further comprises transmitted beam detecting means for detecting a transmitted beam which is the charged particle beam penetrating the sample provided on a sample stage when the sample is scanned by the charged particle beam. |
申请公布号 |
US2004031936(A1) |
申请公布日期 |
2004.02.19 |
申请号 |
US20030612567 |
申请日期 |
2003.07.02 |
申请人 |
OI MASAMICHI;ASAHATA TATSUYA |
发明人 |
OI MASAMICHI;ASAHATA TATSUYA |
分类号 |
G03F1/16;G01Q30/02;G03F1/72;G03F1/74;H01J37/00;H01J37/244;H01J37/26;H01J37/28;H01J37/304;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01J37/304 |
主分类号 |
G03F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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