发明名称 Fine stencil structure correction device
摘要 A fine stencil structure correction device has a charged particle beam microscope lens-barrel which scans and corrects shapes of defect portions of a fine stencil structure sample using an etching or deposition function, and the fine stencil structure correction device further comprises transmitted beam detecting means for detecting a transmitted beam which is the charged particle beam penetrating the sample provided on a sample stage when the sample is scanned by the charged particle beam.
申请公布号 US2004031936(A1) 申请公布日期 2004.02.19
申请号 US20030612567 申请日期 2003.07.02
申请人 OI MASAMICHI;ASAHATA TATSUYA 发明人 OI MASAMICHI;ASAHATA TATSUYA
分类号 G03F1/16;G01Q30/02;G03F1/72;G03F1/74;H01J37/00;H01J37/244;H01J37/26;H01J37/28;H01J37/304;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01J37/304 主分类号 G03F1/16
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