| 摘要 |
<p>The topography of a sample (403) is measured by using an interferometer having a beam splitter (402), a tilted reference mirror (401) and a detector (405). A data processing unit measures a first set of fringe line disturbances to generate a first set of profiles that describe the topography of said sample, said first set of profiles mapping to traces that run over a first axis of said sample, adjusts the relative position of said traces to said sample to create a second set of fringe line disturbances, measures said second set of interferometer fringe line disturbances to generate a second set of profiles that describe the topography, and interleaves said first and second set of profiles to create a topography description having enhanced resolution. The method may further involve characterizing the sample as being comprised of a certain material by matching a reflectivity vs. wavelength curve.</p> |
