| 摘要 |
PURPOSE: To provide a method for manufacturing a liquid crystal display element, with which generation of a pit originating from a pit source 14 such as a micro scratch is suppressed in chemical etching of surfaces 11a, 12a of glass substrates 11, 12. CONSTITUTION: A first etchant 23 and a second etchant 24 with respectively different rates of etching are used. At first, the surfaces 11a, 12a of the glass substrates 11, 12 are etched with the first etchant 23 with a faster rate of etching. In this case, even when the pit source 14 is present on the surfaces 11a, 12a of the glass substrates 11, 12, the pit source 14 is removed from both layers of the surfaces 11a, 12a because the etching rapidly progresses on the surfaces 11a, 12a. Next, the surfaces 11a, 12a of the glass substrates 11, 12 are etched with the etchant 24 with a slower rate of etching and the surfaces 11a, 12a are smoothed so as to make the glass substrates 11, 12 thick as desired.
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