| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist peeling apparatus capable of preventing a variance in concentration of an effective component contained in a resist peeling solution, reducing the amount of the solution used and reducing the amount of waste gas to be treated. SOLUTION: The resist peeling apparatus 100 has a rinsing system 2 with a rinsing chamber 21, which is provided on a resist peeling system 1 with a plurality of resist stripping chambers 11 arranged in succession. The resist peeling chambers 11 are purged with gaseous nitrogen from a gaseous nitrogen supply system 7. A gaseous mixture containing a component of an aqueous resist peeling solution R1 generated in the chambers 11 is sent to a liquid recovery-supply system 3 and subjected to gas-liquid separation. A recovered resist peeling solution R2 is returned to a peeling solution tank 13 and a separated gas G is used for dewatering a substrate W supplied to each gas knife 12 in the chambers 11. COPYRIGHT: (C)2004,JPO |
