| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of replacing processing liquid so as not to leave air bubbles inside a magnet pump after the replacement of the processing liquid. SOLUTION: The substrate processing apparatus is provided with an air valve 14 by branching a pipe in the vicinity of a delivery port 41b of the magnet pump 4, and a liquid level sensor 15 placed at a position slightly higher than the position of the delivery port 41b of the magnet pump 4. In discharging a cleaning liquid 3, when the air valve 14 is opened as soon as the liquid surface 3s is descended and passes through the liquid level sensor 15, discharging of the magnet pump 4 is promoted through the action of atmospheric pressure. In supplying the cleaning liquid 3 when the liquid surface 3s rises while filling the inside of the magnet pump 4 and reaches the position of the liquid level sensor 15, the air valve 14 is closed in response to a sensing signal of the liquid surface 3s by the liquid level sensor 15 so as to automatically fill in the cleaning liquid 3 without producing air bubbles in the inside. COPYRIGHT: (C)2004,JPO
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