APPARATUS WHICH DRIES SEMICONDUCTOR SUBSTRATE BY MEANS OF AZEOTROPE MIXTURE LAYER AND DRYING METHOD BY USING THE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an apparatus which dries semiconductor substrates by means of an azeotrope mixture layer. SOLUTION: This drying apparatus has a liquid tank (1) which contains a liquid (5), a chamber (3) provided over the liquid tank, a dispenser (11) which supplies an organic solvent to the surface of the liquid. When the organic solvent is supplied through the dispenser, an azeotrope mixture layer (5a) is formed on the surface of the liquid, and an organic solvent layer (11a) is formed over the azeotrope mixture layer. The organic solvent layer and atmosphere over it are heated by a heater (13). The inside of the chamber is filled with a dry gas supplied through a dry gas pipe (17). COPYRIGHT: (C)2004,JPO