发明名称 SELF-ALIGNED VERTICAL GATE SEMICONDUCTOR DEVICE
摘要 A transistor (10) is formed in a semiconductor substrate (12) whose top surface (48) is formed with a pedestal structure (24). A conductive material (40) is disposed along a side surface (28) of the pedestal structure to self-align an edge of a first conduction electrode (45) of the transistor. A dielectric spacer (55) is formed along a side surface (49) of the conductive material to self-align a contact area (56) of the first conduction electrode.
申请公布号 US2004031981(A1) 申请公布日期 2004.02.19
申请号 US20020219190 申请日期 2002.08.16
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC. 发明人 GRIVNA GORDON M.
分类号 H01L21/28;H01L21/331;H01L21/336;H01L29/06;H01L29/423;H01L29/732;H01L29/78;(IPC1-7):H01L29/76 主分类号 H01L21/28
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