| 发明名称 |
PLASMA HEATING APPARATUS AND METHODS |
| 摘要 |
Apparatus and methods for plasma-assisted heating are provided. In one embodiment, a heating apparatus can include a cavity (14) for containing a gas. The cavity can have a thermally conductive wall and a radiation-transmissive wall. At least one electromagnetic radiation source (26) can be used to irradiate the gas in the cavity to ignite plasma in the cavity. The heating apparatus can also include a heating region located external to the cavity and adjacent the thermally conductive wall. Various plasma catalysts are also provided. |
| 申请公布号 |
WO03096747(A3) |
申请公布日期 |
2004.02.19 |
| 申请号 |
WO2003US14133 |
申请日期 |
2003.05.07 |
| 申请人 |
DANA CORPORATION;KUMAR, SATYENDRA;KUMAR, DEVENDRA |
发明人 |
KUMAR, SATYENDRA;KUMAR, DEVENDRA |
| 分类号 |
B01J7/00;A62D3/00;B01D53/86;B01D53/92;B01J19/08;B01J19/12;B01J37/34;B22F3/105;C01B3/02;C21D1/06;C21D1/09;C21D1/38;C22B4/00;F01N3/08;F01N3/10;F01N3/20;F01N3/24;F01N3/28;F01N3/30;F01N9/00;F01N13/10;F27B17/00;F27D3/12;F27D11/08;F27D11/12;G21K5/00;H01J37/32;H01M8/06;H05B6/68;H05B6/78;H05B6/80;H05H1/24;H05H1/46 |
主分类号 |
B01J7/00 |
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