IMAGE FORMING MATERIAL HAVING BLUISH-VIOLET LASER-PHOTOSENSITIVE RESIST MATERIAL LAYER AND RESIST IMAGE FORMING METHOD THEREFOR

摘要

An image forming material having a bluish-violet laser-photosensitive resist material layer highly sensitive to a laser beam in a bluish-violet region and free from a decrease in sensitivity even a film thickness is increased. An image forming material comprising a bluish-violet laser-photosensitive resist material layer formed on a substrate to be worked, wherein the photosensitive resist material layer has a bluish-violet laser-photosensitive resist material layer having a film thickness of at least 10 mum and an absorbance at a wavelength of 405 nm of up to 0.3 per film thickness of 1 mum; and a resist image forming method of scanning and exposing the photosensitive resist material layer of the image forming material by a laser beam having a wavelength of 320-450 nm, and then developing the resultant material.